{"id":115734,"date":"2025-12-29T12:08:15","date_gmt":"2025-12-29T12:08:15","guid":{"rendered":"https:\/\/ekamu.net\/?p=115734"},"modified":"2025-12-29T12:08:15","modified_gmt":"2025-12-29T12:08:15","slug":"cinin-calinti-euv-makinesi-henuz-tek-bir-cip-bile-uretemedi","status":"publish","type":"post","link":"https:\/\/ekamu.net\/index.php\/2025\/12\/29\/cinin-calinti-euv-makinesi-henuz-tek-bir-cip-bile-uretemedi\/","title":{"rendered":"\u00c7in\u2019in \u201c\u00e7al\u0131nt\u0131\u201d EUV makinesi hen\u00fcz tek bir \u00e7ip bile \u00fcretemedi"},"content":{"rendered":"<p><figure> <span> <img decoding=\"async\" src=\"https:\/\/ekamu.net\/wp-content\/uploads\/2025\/12\/cinin-calinti-euv-makinesi-henuz-tek-bir-cip-bile-uretemedi-0-83jjWqkS.jpg\"\/> <\/span> Son d\u00f6nemde k\u00fcresel yar\u0131 iletken sekt\u00f6r\u00fcnde b\u00fcy\u00fck yank\u0131 uyand\u0131ran <strong>\u00c7in<\/strong>\u2019in <strong>ASML<\/strong>\u2019nin <strong>EUV<\/strong> litografi makinesini kopyalad\u0131\u011f\u0131 iddialar\u0131, g\u00f6r\u00fcn\u00fc\u015fe g\u00f6re ger\u00e7eklikle pek \u00f6rt\u00fc\u015fm\u00fcyor. \u0130lk ba\u015fta ASML\u2019nin en kritik ve en ileri teknolojisi olarak g\u00f6r\u00fclen EUV (A\u015f\u0131r\u0131 Ultraviyole) litografi sistemlerinin \u00c7in taraf\u0131ndan gizlice tersine m\u00fchendislik y\u00f6ntemiyle \u00e7\u00f6z\u00fcld\u00fc\u011f\u00fc \u00f6ne s\u00fcr\u00fclm\u00fc\u015ft\u00fc. Ancak ortaya \u00e7\u0131kan tablo, bu s\u00f6ylentilerin <strong>b\u00fcy\u00fck \u00f6l\u00e7\u00fcde abart\u0131ld\u0131\u011f\u0131n\u0131<\/strong> g\u00f6steriyor. <\/figure>\n<p><b>\u0130ddialar abart\u0131l\u0131<\/b><\/p>\n<p>Aktar\u0131lan bilgilere g\u00f6re, \u00c7in\u2019de geli\u015ftirildi\u011fi iddia edilen s\u00f6z konusu EUV sistemi, i\u015flevsel bir \u00fcretim arac\u0131 olmaktan olduk\u00e7a uzak. Kaynaklar, bu prototipin farkl\u0131 kanallardan temin edilmi\u015f, birbiriyle tam uyumlu olmayan par\u00e7alar\u0131n bir araya getirilmesiyle olu\u015fturulmu\u015f oldu\u011funu belirtiyor. \u0130kinci el ekipman sat\u0131\u015flar\u0131 ve \u00e7evrim i\u00e7i yedek par\u00e7a pazarlar\u0131ndan sa\u011fland\u0131\u011f\u0131 d\u00fc\u015f\u00fcn\u00fclen bile\u015fenlerle olu\u015fturulan bu sistemin, bug\u00fcne kadar <strong>tek bir \u00e7ip dahi \u00fcretemedi\u011fi <\/strong>ifade ediliyor.<\/p>\n<figure> <span> <img decoding=\"async\" src=\"https:\/\/ekamu.net\/wp-content\/uploads\/2025\/12\/cinin-calinti-euv-makinesi-henuz-tek-bir-cip-bile-uretemedi-1-6QuyiQ2I.jpg\"\/> <\/span> Bu durumun temel nedeni, EUV litografi teknolojisinin ola\u011fan\u00fcst\u00fc karma\u015f\u0131kl\u0131\u011f\u0131. ASML\u2019nin Twinscan NXE platformu, tek bir teknik \u00e7izim ya da kolayca kopyalanabilecek bir tasar\u0131mdan ibaret de\u011fil. Aksine, ABD, Avrupa ve Japonya merkezli binlerce tedarik\u00e7inin onlarca y\u0131la yay\u0131lan ortak Ar-Ge \u00e7al\u0131\u015fmas\u0131n\u0131n \u00fcr\u00fcn\u00fc olarak \u00f6ne \u00e7\u0131k\u0131yor. Hassas optikler, ultra y\u00fcksek vakum sistemleri, geli\u015fmi\u015f kontrol yaz\u0131l\u0131mlar\u0131 ve te\u015fhis ara\u00e7lar\u0131 gibi bir\u00e7ok kritik bile\u015fen farkl\u0131 \u015firketlerin sahip oldu\u011fu \u00f6zel bilgi birikimiyle \u00fcretiliyor. <\/figure>\n<p><b>Par\u00e7alar\u0131 bir araya getirmek bile yetmiyor<\/b><\/p>\n<p>Bu tedarik zincirinin en kritik halkalar\u0131ndan biri, ASML\u2019nin 2012 y\u0131l\u0131nda b\u00fcnyesine katt\u0131\u011f\u0131 ABD merkezli <strong>Cymer<\/strong>. Cymer\u2019in geli\u015ftirdi\u011fi EUV \u0131\u015f\u0131k kayna\u011f\u0131, <strong>CO2 lazerle<\/strong> olu\u015fturulan plazma \u00fczerinden 13,5 nanometre dalga boyunda \u0131\u015f\u0131n\u0131m \u00fcretimine dayan\u0131yor. Donan\u0131m\u0131n fiziksel olarak kopyalanmas\u0131 teorik olarak m\u00fcmk\u00fcn g\u00f6r\u00fcnse bile, y\u00fcksek hacimli \u00fcretimi s\u00fcrd\u00fcrebilmek i\u00e7in gerekli olan <strong>\u00f6zel yaz\u0131l\u0131mlar olmadan sistemin \u00e7al\u0131\u015fmas\u0131 imkans\u0131z<\/strong> kabul ediliyor. Bu seviyede bir yaz\u0131l\u0131m-donan\u0131m entegrasyonunu ise bug\u00fcne kadar ASML d\u0131\u015f\u0131nda hi\u00e7bir yap\u0131 ba\u015faramad\u0131.<\/p>\n<figure> <span> <img decoding=\"async\" src=\"https:\/\/ekamu.net\/wp-content\/uploads\/2025\/12\/cinin-calinti-euv-makinesi-henuz-tek-bir-cip-bile-uretemedi-2-mFrpE8EM.jpg\"\/> <\/span> EUV teknolojisinin bir di\u011fer a\u015f\u0131lmas\u0131 g\u00fc\u00e7 engeli ise optikler. T\u00fcm EUV sistemleri, <strong>Carl<\/strong> <strong>Zeiss<\/strong> taraf\u0131ndan \u00fcretilen <strong>molibden-silikon<\/strong> \u00e7ok katmanl\u0131 aynalara ba\u011f\u0131ml\u0131. Bu aynalar, a\u015f\u0131r\u0131 mor\u00f6tesi \u0131\u015f\u0131\u011f\u0131 neredeyse kay\u0131ps\u0131z yans\u0131tmak zorunda ve Zeiss, bu optikleri \u00fcretebilen d\u00fcnyadaki tek \u015firket konumunda bulunuyor. Uzmanlara g\u00f6re, bu aynalar\u0131n yeniden \u00fcretilebilmesi i\u00e7in malzeme bilimi ve \u00f6l\u00e7\u00fcm teknolojilerinde y\u0131llar s\u00fcrecek at\u0131l\u0131mlar gerekiyor. <\/figure>\n<p>ASML\u2019nin m\u00fchendislik ba\u015far\u0131s\u0131 yaln\u0131zca par\u00e7alar\u0131 bir araya getirmekle s\u0131n\u0131rl\u0131 de\u011fil. \u015eirket, binlerce \u00f6zel alt sistemi tek bir makinede senkronize ederek nanometre \u00f6l\u00e7e\u011finde do\u011frulu\u011fu y\u00fcksek h\u0131zda koruyabilen bir yap\u0131 olu\u015fturuyor. Bu bilgi birikiminin \u00f6nemli bir k\u0131sm\u0131, ASML\u2019nin tedarik\u00e7ileri ve ara\u015ft\u0131rma ortaklar\u0131 aras\u0131nda da\u011f\u0131lm\u0131\u015f durumda.<\/p>\n<p>Buna ra\u011fmen \u00c7inli \u00e7ip \u00fcreticileri tamamen eli kolu ba\u011fl\u0131 de\u011fil. <strong>SMIC<\/strong> gibi firmalar\u0131n, ASML\u2019nin daha eski nesil DUV (Derin Ultraviyole) litografi sistemlerini yenilenmi\u015f mod\u00fcller ve ikinci el performans verileriyle g\u00fcncelledi\u011fi bildiriliyor. Bu y\u00f6ntemle DUV makinelerinin kullan\u0131m \u00f6mr\u00fc uzat\u0131l\u0131rken, ileri \u00fcretim s\u00fcre\u00e7lerinde verimlilik s\u0131n\u0131rl\u0131 da olsa art\u0131r\u0131labiliyor. Ancak bu \u00e7\u00f6z\u00fcmler, modern bir EUV platformunun sundu\u011fu kapasite ve hassasiyetin yan\u0131na dahi yakla\u015fam\u0131yor.<\/p>\n<p>Sonu\u00e7 olarak \u00c7in\u2019in EUV litografi alan\u0131nda bir at\u0131l\u0131m yapt\u0131\u011f\u0131 y\u00f6n\u00fcndeki iddialar\u0131n, mevcut veriler \u0131\u015f\u0131\u011f\u0131nda ger\u00e7e\u011fi yans\u0131tmad\u0131\u011f\u0131 bildiriliyor. Ortada \u00e7al\u0131\u015fan bir sistem ya da \u00fcretilmi\u015f bir \u00e7ip bulunmazken, EUV teknolojisinin halen ASML ve onun benzersiz ekosisteminin tekelinde oldu\u011fu belirtiliyor.<\/p>\n\n<p><span style=\"display: block; width: 343.125px; color: rgb(55, 58, 60); font-size: 14px; background-color: rgb(255, 249, 236);\"><\/span><\/p>\n<p>Kaynak :\u00a0<span style=\"background-color: rgb(255, 249, 236); color: rgb(55, 58, 60); font-size: 14px;\">https:\/\/www.donanimhaber.com\/cin-in-calinti-euv-makinesi-henuz-tek-bir-cip-bile-uretemedi&#8211;200247<\/span><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Son d\u00f6nemde k\u00fcresel yar\u0131 iletken sekt\u00f6r\u00fcnde b\u00fcy\u00fck yank\u0131 uyand\u0131ran \u00c7in\u2019in ASML\u2019nin EUV litografi makinesini kopyalad\u0131\u011f\u0131 iddialar\u0131, g\u00f6r\u00fcn\u00fc\u015fe g\u00f6re ger\u00e7eklikle pek \u00f6rt\u00fc\u015fm\u00fcyor. \u0130lk ba\u015fta ASML\u2019nin en kritik ve en ileri teknolojisi olarak g\u00f6r\u00fclen EUV &#8230;<\/p>\n","protected":false},"author":1,"featured_media":115735,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[8],"tags":[380,1513,6399,641,431],"class_list":["post-115734","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-teknoloji","tag-cin","tag-euv","tag-litografi","tag-sistem","tag-tek"],"_links":{"self":[{"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/posts\/115734","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/comments?post=115734"}],"version-history":[{"count":1,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/posts\/115734\/revisions"}],"predecessor-version":[{"id":115739,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/posts\/115734\/revisions\/115739"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/media\/115735"}],"wp:attachment":[{"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/media?parent=115734"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/categories?post=115734"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/ekamu.net\/index.php\/wp-json\/wp\/v2\/tags?post=115734"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}